Aurovibe vibration measurements according to SBR Directive C Fault Equipment

Vibration measurements SBR C

The measurement and assessment C "Malfunction of equipment" provides a procedure for measuring and assessing vibrations regarding vibration-sensitive equipment, including:

     •  Optical equipment such as mass spectrometers
     •  CD manufacturing equipment
     •  Mainframe data centers
     •  Eye laser equipment
     •  Weighing instruments
     •  Printing equipment (passports, etc.)

The AuroVibe is fully automated and able to test vibrations remotely against the requirements of the manufacturer and/or BBN (Bolt, Beranek and Newman), and FHA criteria (Frank Hubach Associates).

SBR Directive B (fault/damage to equipment vibration) .
Classification and criteria by Bolt, Beranek &Newman Inc.  
Type of equipment or use Veff microns / s*) Veff µm/s*)
Housing; computer 200,00
Operating rooms; microscope with a magnification of 100 x 100.00 100.00
Microscopes with a magnification of 400 x, optical and other precision balances; positioning equipment; metrological laboratory spaces; optical comparators; manufacturing equipment for microelectronics (class A) 50.00
Micro-surgery, eye and nerve operations; microscope with a magnification greater than 400 x; optical equipment in isolated positions; manufacturing equipment for microelectronics (class B) 25.00
Electron microscopes with magnifications up to 30,000 x; Microtomes, magnetic resonance imagers; manufacturing equipment for microelectronics (class C) 12.50
Electron Microscopes with more than 30,000 x magnifications; mass spectrometers; cell implantation equipment; manufacturing equipment for microelectronics (class D) 6.25
Uninsulated laser / optical systems research; manufacturing equipment for microelectronics (class E) 3.15
*) In the frequency range of 8 to 80Hz per third.  
Equipment Class Class
Inspection, test probe and other auxiliary equipment to manufacture A A

Aligners, steppers and other critical equipment for photolithography with linewidth of
3um or more B

B
Aligners, steppers and other critical equipment for photolithography with line width of 1um or more C C
Aligners, steppers and other critical equipment for photolithography with line widths of 0,5um and E-beam equipment D D
Aligners, steppers and other critical equipment for photolithography with line widths of 0,25um and E-beam equipment E E